제품소개
EIS-3000
Wafer Diameter | 300mm silicon wafer |
---|---|
Wafer Thickness | 500 ~ 1,000㎛ |
Edge Inspection | Judgement (OK / NG) |
Classification, Position | |
Chip, Fracture, Scratch, Stain, Particle | |
Notch Inspection | Chip, Crack, Scratch, Wheel Mark, Stain |
Detected Information | Types of defects |
Rotating coordinate from Origin | |
Size of defects | |
Throughput | 90 wfr/h |
Dimension | 1670㎜(W) x 2440㎜(D) x 2002㎜(H) |
Detail view