WISFAC's EIS-3000 is a device that detects various defects in the Notch and Edge of a 12" silicon wafer.
As semiconductors continue to be miniaturized, wafer edge inspection is important to perform root cause analysis to improve yield of 12" silicon wafer process.
WISFAC's EIS-3000 intelligently analyzes defects detected with 12" Si wafers. The EIS-3000 can detect the following types of faults.
It detects Chip, Crack, Scratch, Wheelmark, Stain and provides special calibration wafers and automatic vision and motion systems.